METHOD AND APPARATUS FOR MEASURING FILM THICKNESS FILM THICKNESS CONTROL METHOD, AND FILM THICKNESS CONTROLLER

摘要

PROBLEM TO BE SOLVED: To provide a novel method and apparatus for measuring film thickness capable of measuring precisely a film thickness very easily in a short time.;SOLUTION: The method acquires a measuring spectrum having optical wavelength dependency for a substrate formed with a thin film, and then acquires a primary simulation spectrum approximated to the measuring spectrum, based on prescribed primary simulation. The measuring spectrum and the primary simulation spectrum are arithmetic-processed thereafter, an approximate function is set for an obtained computed value, and a secondary simulation spectrum most approximated to the measuring spectrum is obtained, based on prescribed secondary simulation. The film thickness of the thin film is calculated thereafter from a result of the secondary simulation spectrum. The approximate function is multiplied therein with a simulation spectrum under a drawing-out process, in the secondary simulation spectrum.;COPYRIGHT: (C)2006,JPO&NCIPI