首页> 外国专利> METHOD FOR ALIGNING MASK WITH SUBSTRATE, METHOD FOR VAPOR-DEPOSITING ORGANIC THIN FILM, AND ALIGNING DEVICE

METHOD FOR ALIGNING MASK WITH SUBSTRATE, METHOD FOR VAPOR-DEPOSITING ORGANIC THIN FILM, AND ALIGNING DEVICE

机译:用基质对掩膜进行雾化的方法,对有机薄膜进行气相沉积的方法以及对设备进行雾化的方法

摘要

PPROBLEM TO BE SOLVED: To accurately align a mask with a substrate by supporting the substrate so as not contact with the mask without applying a tension to it, and by precisely detecting a position of a mark for detecting the positions of the substrate and the mask. PSOLUTION: The method for aligning the mask with the substrate comprises the steps of: holding a metal mask 12 having a pattern formed therein on a mask mount 4; illuminating the mark 14 for detecting the position placed in a corner of the mask by using a light source 8 and a reflector plate assembly from a lower side, and taking a photograph of the mark 14 with a charge-coupled device camera 10 from above; supporting both sides of a transparent substrate 11 which has been transported to the upper part of the mask 12 while directing the surface to be vapor-deposited downward, with a hook member so as to create a gap between the substrate and the mask; illuminating the mark 13 placed in the corner of the substrate with a light source 9 from above, and taking a photograph of the mark 13 with the CCD camera 10; computing a relative position of the substrate to the mask from the information on the mark position obtained by processing for an image provided by the photographs of the marks of the mask and the substrate, with an arithmetic unit 20; and moving the substrate so that the relative position of the substrate and the mask can be in a predetermined allowable range, on the basis of the computed relative position. PCOPYRIGHT: (C)2006,JPO&NCIPI
机译:

要解决的问题:通过支撑基板以使其不施加张力而不会与掩模接触,并通过精确地检测用于检测基板位置的标记的位置来使掩模与基板精确对准。和面具。

解决方案:用于将掩模与基板对准的方法包括以下步骤:将具有形成在其中的图案的金属掩模12保持在掩模安装件4上;通过使用光源8和反射板组件从下侧照亮用于检测放置在掩模的角落中的位置的标记14,并从上方用电荷耦合器件照相机10拍摄标记14的照片;用钩构件支撑已被传送到掩模12的上部的透明基板11的两侧,同时引导要被气相沉积的表面向下,从而在基板和掩模之间形成间隙;从上方用光源9照射位于基板的角部的标记13,并用CCD相机10拍摄标记13的照片。利用算术单元20,根据通过对掩模和基板的标记的照片所提供的图像进行处理而获得的与标记位置有关的信息,计算基板相对于掩模的相对位置;根据计算出的相对位置移动基板,使得基板和掩模的相对位置可以在预定的允许范围内。

版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006176809A

    专利类型

  • 公开/公告日2006-07-06

    原文格式PDF

  • 申请/专利权人 ULVAC JAPAN LTD;

    申请/专利号JP20040369446

  • 发明设计人 FUKAO MARI;MAEHIRA IZUMI;

    申请日2004-12-21

  • 分类号C23C14/24;C23C14/04;H05B33/10;H01L51/50;

  • 国家 JP

  • 入库时间 2022-08-21 21:52:09

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