DLC FILM OR SiO2 FILM, VESSEL AND CVD FILM DEPOSITION SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a CVD (Chemical Vapor Deposition) system capable of depositing a film having light shielding properties to ultraviolet rays and also having transparency.;SOLUTION: The CVD film deposition system where a film is deposited on the outer surface of each vessel 2 by a plasma CVD process is provided with: an outer circumferential electrode 14 arranged so as to surround the outside face of the vessel 2; and a raw material feeding mechanism 22 of feeding a starting raw material to the outer surface of each vessel 2. The system is further provided with an electrode 16 arranged at the inside of the neck part 2a of each vessel 2. In this case, the electrode 16 preferably has a surface with a shape almost similar to the inside shape of the neck part 2a or mouth of the vessel 2. It is also preferable that the electrode 16 has a surface at an almost equal distance from the inside face of the neck part 2a or mouth of the vessel 2.;COPYRIGHT: (C)2006,JPO&NCIPI