The general integrated lithography process control system which is based on the feedback system of the product design and yield rate

摘要

This invention offers the system and the method of making the execution of production process easy. Critical parameter generally is appraised as for quality queue as quality queue, weight attaches according to the importance of the respective parameter for the design intention of one or more. Critical parameter, the product design, simulation and the test result, following to information such as yield rate data and electric data, weight is attached by factor. It can form the quality index where this invention compound of present production process score is next. Next, the control system, comparing quality index and design specification, it can decide whether or not it can allow present production process. When it cannot allow process, test parameter of the process which is in the midst of executing is modified and process and can reprocess be reexecuted profit, concerning the process which is completed. This way, it is possible to customize the respective layer of the device concerning specification and the quality index which differ according to the product design and yield rate.