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Method and the device in order to control production process on the basis of the electric quality which was requested with measurement

机译:为了根据测量所要求的电能质量来控制生产过程的方法和装置

摘要

Method of this invention, following to operational reshipi, has the step which one executes the process which forms the structure of the semiconductor device at least. Electric performance characteristic of this structure is measured. Set point of electric performance characteristic and that electric performance characteristic which were requested with measurement is compared. On the basis of this comparison, operation reshipi one parameter is decided at least. The system (10,100), the process device (30 - 80,200,210,220,230), the measuring device (30 - 80,250) and the controller (140) it has. The process device (30 - 80,200,210,220,230), following to operation reshipi, in order one to execute the process which forms the structure of the semiconductor device at least, it is constituted. The measuring device (30 - 80,250), in order to measure the electric performance characteristic of structure, it is constituted. The controller (140), comparing with the set point of electric performance characteristic and that electric performance characteristic which were requested with measurement, in order to decide at least one parameter of operation reshipi on the basis of this comparison, it is constituted.
机译:在操作之后,本发明的方法具有至少执行形成半导体器件的结构的过程的步骤。测量该结构的电性能特征。比较电性能特性的设定点和测量所要求的电性能特性。基于该比较,至少确定一个操作参数。系统(10,100),处理设备(30-80,200,210,220,230),测量设备(30-80,250)和控制器(140)。处理装置(30-80,200,210,220,230),在重新进行操作之后,为了至少执行形成半导体装置的结构的处理而构成。为了测量结构的电性能特性,构成测量装置(30〜80,250)。控制器(140)与电性能特性的设定点和测量所要求的电性能特性进行比较,以基于该比较来决定至少一个运行参数。

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