CHEMICAL MECHANICAL POLISHING METHOD FOR DIAMOND SURFACE

摘要

PROBLEM TO BE SOLVED: To solve problems such as an increase in cost due to polishing step using a special device because chemical polishing of diamond thin film requires high-temperature environment or special reaction, complicated work step due to polishing only in a vacuum environment, toxicity of abrasive grains to workers in working environment, and environmental load of exhaust based on current environment regulations (ease of processing).;SOLUTION: An artificial diamond thin film or a thin plate is immersed in a polishing liquid wherein alumina abrasive grains are dispersed in water, and a lapping machine is rotated to graze the surface of the thin film or thin plate of the artificial diamond by the alumina abrasive grains. Such a method is used to polish the surface of diamond chemically and mechanically.;COPYRIGHT: (C)2006,JPO&NCIPI