GAS REPLACING APPARATUS OF ACCOMMODATION VESSEL AND GAS REPLACING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To replace, within a short period of time, the gas in an ordinary semiconductor wafer accommodating vessel not including a gas introducing hole, and also to purify the semiconductor wafer surface.;SOLUTION: The gas replacing apparatus is constituted with a semiconductor wafer accommodation vessel mounting means 3 which can mount the accommodation vessel 1 in the air-tight state in order to completely accommodate a cover 2 into a gas replacing path, gas introducing means 6, 7, 8 for introducing the gas from a gap between the accommodation vessel 1 and the cover 2 under the condition that the cover 2 is opened within the semiconductor wafer accommodation vessel mounting means 3, a gas evacuating means 9 for exhausting the gas of the accommodation vessel 1, a gas circulating means 11 for circulating the gas of the accommodation vessel 1 via a chemical absorbing filter 10, and gas flow switching means 18, 19 for switching flow of gas between the gas evacuating means 9 and the gas circulating means 11.;COPYRIGHT: (C)2006,JPO&NCIPI