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A method of manufacturing a semiconductor device and reticle inspection method set, a method of designing a reticle set, exposure monitoring method, the reticle set
A method of manufacturing a semiconductor device and reticle inspection method set, a method of designing a reticle set, exposure monitoring method, the reticle set
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机译:制造半导体器件的方法和掩模版检查方法组,设计掩模版组的方法,曝光监视方法,掩模版组
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摘要
A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.
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