The resolution means resolution the production mannered null incident light

摘要

PPROBLEM TO BE SOLVED: To control a manufacturing process of a semiconductor device based on a dimension determined by a processed-object dimension measurement process for measuring side dimensions of a pattern formed on a wafer in a non-contact and non-destructive manner at a high speed by using ellipsometry. PSOLUTION: About a correction pattern on the wafer of which dimensions are confirmed, the dimension is determined by determining a polarization state parameter to create a database and searching the database based on a polarization parameter of a measurement specimen. PCOPYRIGHT: (C)2006,JPO&NCIPI