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In production manner of grating constant adjustment substrate inside surface and on grating constant adjustment substrate
In production manner of grating constant adjustment substrate inside surface and on grating constant adjustment substrate
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机译:光栅常数调整基板的内表面和光栅常数调整基板的生产方式
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摘要
PROBLEM TO BE SOLVED: To provide a method of controlling the in-plane lattice constant of a substrate and an in-plane lattice constant control substrate. ;SOLUTION: A first epitaxial thin film 2 comprising a first material is formed on a substrate 1 at a first predetermined temperature, and then a second epitaxial thin film 6 comprising a second material containing the first material and another material capable of forming a solid solution with the first material in a predetermined component ratio is formed on the first epitaxial thin film 2, and further heat treatment is carried out at a second predetermined temperature. By the heat treatment at the second predetermined temperature, dislocations 4 are introduced and the lattice constant of the second epitaxial thin film 6 is alleviated to a value close to the lattice constant of a bulk crystal of the second material. A desired in-plane lattice constant can be realized by selecting the component ratio of another material in the second material.;COPYRIGHT: (C)2003,JPO
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