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Alternative methodology for defect simulation and system

机译:缺陷仿真和系统的替代方法

摘要

A system for defect simulation is provided. A defect layout generator generates a defect layout comprising a given number of spot defects of a given size. A processor first compares the defect layout and a provided circuit layout comprising a plurality of conductive regions. The processor further determines whether the spot defects are located on the conductive regions, and determines whether short-circuits and/or open circuits are caused by the spot defects in the conductive regions.
机译:提供了一种用于缺陷仿真的系统。缺陷布局生成器生成包括给定数量的给定尺寸的斑点缺陷的缺陷布局。处理器首先将缺陷布局与提供的包括多个导电区域的电路布局进行比较。处理器进一步确定斑点缺陷是否位于导电区域上,并且确定短路和/或开路是否由导电区域中的斑点缺陷引起。

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