首页> 外国专利> Method for preparing ge1-x-ysnxey (e=p, as, sb) semiconductors and related si-ge-sn-e and si-ge-e analogs

Method for preparing ge1-x-ysnxey (e=p, as, sb) semiconductors and related si-ge-sn-e and si-ge-e analogs

机译:制备ge1-x-ysnxey(e = p,as,sb)半导体及相关si-ge-sn-e和si-ge-e类似物的方法

摘要

A process for is provided for synthesizing a compound having the formula E(GeH3)3 wherein E is selected from the group consisting of arsenic (As), antimony (Sb) and phosphorus (P). GeH3Br and [CH3)3Si]3E are combined under conditions whereby E(GeH3)3 is obtained. The E(GeH3)3 is purified by trap-to-trap fractionation. Yields from about 70% to about 76% can be obtained. The E(GeH3)3 can be used as a gaseous precursor for doping a region of a semiconductor material comprising Ge, SnGe, SiGe and SiGeSn in a chemical vapor deposition reaction chamber.
机译:提供了一种用于合成具有式E(GeH 3 3 的化合物的方法,其中E选自砷(As),锑(Sb)和磷(P)。在以下条件下将GeH 3 Br和[CH 3 3 Si] 3 E合并Sub> 3 3 已获得。 E(GeH 3 3 通过捕集到捕集分离纯化。可获得约70%至约76%的产率。 E(GeH 3 3 可用作气态前体,用于在化学气相沉积反应中掺杂包括Ge,SnGe,SiGe和SiGeSn的半导体材料区域室。

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