首页> 外国专利> THERMALLY DEVELOPABLE MATERIALS WITH NARROW DISPERSE AMORPHOUS SILICA

THERMALLY DEVELOPABLE MATERIALS WITH NARROW DISPERSE AMORPHOUS SILICA

机译:具有窄分散非晶硅的可热加工材料

摘要

Thermally developable materials including photothermographic and thermographic materials having an outermost backside layer that includes amorphous silica particles having a narrow particle size distribution. The narrower particle size distribution provides reduced haze and increased surface roughness that reduces blocking and machine feeding at comparable weight percent. The materials can also include conductive layers underneath the outermost backside layer.
机译:具有可显影材料的热显影材料,包括具有最外背面层的光热敏照相材料和热成像材料,该背面层包括粒度分布窄的无定形二氧化硅颗粒。较窄的粒度分布可降低雾度​​并增加表面粗糙度,从而以相当的重量百分比减少粘连和机器进料。该材料还可以包括最外侧背面层下方的导电层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号