Method and apparatus for providing shear-induced alignment of nanostructure in thin films

摘要

A method and apparatus is disclosed for providing shear-induced alignment of nanostructures, such as spherical nanodomains, self-assembled nanodomains, and particles, in thin films, such as block copolymer (BCP) thin films. A silicon substrate is provided, and a thin film is formed on the substrate. A pad is then applied to the thin film, and optionally, a weight can be positioned on the pad. Optionally, a thin fluid layer can be formed between the pad and the thin film to transmit shear stress to the thin film. The thin film is annealed and the pad slid in a lateral direction with respect to the substrate to impart a shear stress to the thin film during annealing. The shear stress aligns the nanostructures in the thin film. After annealing and application of the shear stress, the pad is removed, and the nanostructures are uniformly aligned.