Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
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机译:大气压射频非热等离子体放电内部的处理材料
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摘要
Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.
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