PROCESSING MATERIALS INSIDE AN ATMOSPHERIC-PRESSURE RADIOFREQUENCY NONTHERMAL PLASMA DISCHARGE
展开▼
机译:常压辐射非等离子体热放电中的加工材料
展开▼
页面导航
摘要
著录项
相似文献
摘要
Apparatus (Fig.1,4) for the processing of materials involving placing a material (14, Fig.1) either placed between a radio-frequency electrode (13, Fig.1) and a ground electrode (11, Fig.1), or which is itself one of the electrodes (Fig.2). This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.
展开▼