首页> 外国专利> Non-volatile memory element with oxide stack and non-volatile SRAM using the same

Non-volatile memory element with oxide stack and non-volatile SRAM using the same

机译:具有氧化物堆叠的非易失性存储元件和使用该非易失性SRAM的非易失性SRAM

摘要

Non-volatile memory elements having a high programming speed and a reduced constant voltage requirement for data storage. Each memory cell of a non-volatile SRAM includes an SRAM unit and a non-volatile memory unit. When power is off, the data levels of data nodes of the SRAM unit are programmed into a corresponding non-volatile memory element through a pass transistor connected to the data node. When the power is on, the data levels programmed into the non-volatile memory elements are recalled to the corresponding data nodes through the pass transistors, and then the programmed non-volatile memory element is erased. The non-volatile memory element has an oxide stack including a tunnel oxide film, a storage oxide film, and a blocking oxide film. A potential well where the SRAM unit is formed is isolated from a potential well where the non-volatile memory unit is formed. Bias voltages are applied during program, recall and erase modes to the potential well where the non-volatile memory unit is formed.
机译:具有高编程速度和降低的数据存储恒定电压要求的非易失性存储元件。非易失性SRAM的每个存储单元包括SRAM单元和非易失性存储单元。当断电时,SRAM单元的数据节点的数据电平通过连接到数据节点的传输晶体管被编程到相应的非易失性存储元件中。当接通电源时,被编程到非易失性存储元件中的数据电平通过传输晶体管被调用到相应的数据节点,然后被编程的非易失性存储元件被擦除。非易失性存储元件具有包括隧道氧化物膜,存储氧化物膜和阻挡氧化物膜的氧化物堆叠体。形成SRAM单元的势阱与形成非易失性存储单元的势阱隔离。在编程,重调用和擦除模式期间,将偏置电压施加到形成非易失性存储单元的势阱。

著录项

  • 公开/公告号US7110293B2

    专利类型

  • 公开/公告日2006-09-19

    原文格式PDF

  • 申请/专利权人 JIN HYO JUNG;

    申请/专利号US20040022621

  • 发明设计人 JIN HYO JUNG;

    申请日2004-12-27

  • 分类号G11C11/34;

  • 国家 US

  • 入库时间 2022-08-21 21:43:46

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