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SEMICONDUCTOR SCINTILLATION MATERIAL BASED ON COMPOUNDS OF AIIBVI AND A METHOD FOR OBTAINING THEREOF

机译:基于AIIBVI化合物的半导体闪烁材料及其获得方法

摘要

The invention relates to the field of scintillation technique. A semiconductor scintillation material based on compounds of AIIBVI with activating admixture of one of components contains another admixture of one of components, which forms solid substitution solution with initial compound, at that as activator and substitution admixture components are selected, which form binary compounds of AIIBVI and which have difference of ratios of grate parameters as compared with initial compound of AIIBVI?25 % for compound with activating admixture and ?15 % for compound with substitution additive, and difference between electric negativeness of activating admixture and substitution component - ?10 %, and ?5 % - for substitution admixture and component to be substituted. Besides, it contains, in addition hydrogen at a concentration of 1?10-3-5?10-2 mole %, and concentration of oxygen is of 1?10-4-1?10-2 mole %. A method for obtaining material comprises preliminary thermal treatment of the charge in crucible in hydrogen flow at the pressure of (1.1-1.5).106 Pa at simultaneous heating thereof to the temperature of 1000-1100 DEGREE C, burning off the charge and subsequent growing in the atmosphere of inert gas at the pressure of 106-107 Pa by displacement of the crucible through the high temperature zone. Thermal treatment is carried out directly in the growth furnace by displacement of crucible with charge through the high temperature zone at a rate of 20-80 mm/hour, then the charge is cooled in continuous flow of hydrogen to the temperature of 800-900 DEGREE C, hydrogen is evacuated at that temperature to the pressure of 50-150 Pa, thereafter monocrystal is grown in inert gas.
机译:本发明涉及闪烁技术领域。一种基于AIIBVI化合物并具有一种组分的活化混合物的半导体闪烁材料,其中包含一种组分的另一种混合物,该组分与初始化合物形成固体取代溶液,此时选择活化剂和取代混合物组分,形成AIIBVI的二元化合物且与AIIBVI的初始化合物相比,其炉ratio参数比率存在差异:活化混合物的化合物为25%,取代添加剂的化合物为15%,活化混合物与取代组分的电负性之差为-10%, ≤5%-用于取代混合物和要取代的组分。此外,它还含有浓度为1×10-3-5〜10-2摩尔%的氢,氧的浓度为1×10-4-1〜10-2摩尔%。一种获得材料的方法,包括在压力为(1.1-1.5).106 Pa的氢气流中对坩埚中的装料进行初步热处理,同时将其加热到1000-1100℃,烧掉装料并随后生长通过坩埚通过高温区的移动,在惰性气体中以106-107 Pa的压力进入气氛。热处理是通过在坩埚中直接以20-80毫米/小时的速度通过高温区置换装料的坩埚在生长炉中进行的,然后将装料在连续的氢气流中冷却至800-900度的温度C,在该温度下将氢气抽空至50-150 Pa的压力,然后在惰性气体中生长单晶。

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