DIRECT LASER WRITING METHOD FOR FABRICATING THREE-DIMENSIONAL PHOTONIC CRYSTALS WITH INORGANIC MATERIAL SUBSTRATES

摘要

The invention relates to a method for producing photonic crystals during whichan inorganic photoresist is firstly provided that exhibits a phase change whenirradiated with an energy greater than the electronic band gap of thephotoresist. By irradiating the photoresist with a laser beam whose energy isless than the electronic band gap of the photoresist, whose intensity at thefocal point, however, is high enough that non-linear effects occur there, aphase change nevertheless occurs in the photoresist. Afterwards, theirradiated photoresist is subjected to the action of an etching solution thatpreferably dissolves a phase of the photoresist and lastly, the developedphotoresist is removed therefrom in the form of a photonic crystal. Inorganicphotonic crystals produced according to the inventive method are suited foruse in fully optical systems, circuits and components for opticaltelecommunications or computer systems.