首页> 外国专利> Simultaneous self-calibrated sub-aperture stitching for surface figure measurement ( interferometer )

Simultaneous self-calibrated sub-aperture stitching for surface figure measurement ( interferometer )

机译:同时自校正子孔径拼接,用于表面图形测量(干涉仪)

摘要

A method for accurately synthesizing a full-aperture data map from a series of overlapped sub-aperture data maps. In addition to conventional alignment uncertainties, a generalized compensation framework corrects a variety of errors, including compensators that are independent in each sub-aperture. Another class of compensators (interlocked) include coefficients that are the same across all the sub-apertures. A constrained least-squares optimization routine maximizes data consistency in sub-aperture overlap regions. The stitching algorithm includes constraints representative of the accuracies of the hardware to ensure that the results are within meaningful bounds. The constraints also enable the computation of estimates of uncertainties in the final results. The method therefore automatically calibrates the system, provides a full-aperture surface map, and an estimate of residual uncertainties. Therefore, larger surfaces can be tested with greater departures from a best-fit sphere to greater accuracy than was possible in the prior art.
机译:一种用于从一系列重叠的子孔径数据图中准确合成全孔径数据图的方法。除了常规的对准不确定性之外,通用补偿框架还可以校正各种误差,包括在每个子孔径中独立的补偿器。另一类补偿器(互锁)包括所有子孔径上相同的系数。受约束的最小二乘法优化例程可最大化子孔径重叠区域中的数据一致性。拼接算法包括代表硬件精度的约束,以确保结果在有意义的范围内。约束还使得能够计算最终结果中的不确定性估计。因此,该方法会自动校准系统,提供全孔径表面图以及剩余不确定性的估计值。因此,与现有技术相比,可以测试更大的表面,而偏离最佳拟合球的距离更大,精度更高。

著录项

  • 公开/公告号EP1324006B1

    专利类型

  • 公开/公告日2006-03-29

    原文格式PDF

  • 申请/专利权人 QED TECHNOLOGIES INC;

    申请/专利号EP20020027674

  • 申请日2002-12-12

  • 分类号G01B11/255;G06T11/00;G01M11/00;G02B7/00;

  • 国家 EP

  • 入库时间 2022-08-21 21:30:55

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