首页> 外国专利> THIN-FILM TRANSISTOR STRUCTURE, METHOD FOR MANUFACTURING THE THIN-FILM TRANSISTOR STRUCTURE, AND DISPLAY DEVICE USING THE THIN-FILM TRANSISTOR STRUCTURE

THIN-FILM TRANSISTOR STRUCTURE, METHOD FOR MANUFACTURING THE THIN-FILM TRANSISTOR STRUCTURE, AND DISPLAY DEVICE USING THE THIN-FILM TRANSISTOR STRUCTURE

机译:薄膜晶体管结构,制造薄膜晶体管结构的方法以及使用该薄膜晶体管结构的显示装置

摘要

The present invention provides a thin film transistor structure in which at least a trench is formed in an insulating polymer film formed on a substrate. In the thin film transistor structure, a trench formed in the insulating polymer film accommodates a gate wiring constituted of a plurality of conductive layers. Provided also are a method of manufacturing the thin film transistor structure, and a display device including a thin film transistor array composed of the thin film transistors constituted as described above.
机译:本发明提供一种薄膜晶体管结构,其中在形成于基板上的绝缘聚合物膜中至少形成沟槽。在薄膜晶体管结构中,在绝缘聚合物膜中形成的沟槽容纳由多个导电层构成的栅极布线。还提供了一种制造薄膜晶体管结构的方法,以及包括由如上所述构成的薄膜晶体管构成的薄膜晶体管阵列的显示装置。

著录项

  • 公开/公告号EP1369928A4

    专利类型

  • 公开/公告日2006-01-11

    原文格式PDF

  • 申请/专利权人 INTERNATIONAL BUSINESS MACHINES CORPORATION;

    申请/专利号EP20010273779

  • 发明设计人 SUEOKA KUNIAKI;SUZUKI HIROSHI;

    申请日2001-12-18

  • 分类号H01L29/786;G02F1/1368;G09F9/30;H01L21/3205;H01L21/336;

  • 国家 EP

  • 入库时间 2022-08-21 21:30:46

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