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FLUORINE-FREE METALLIC COMPLEXES FOR GAS-PHASE CHEMICAL METAL DEPOSITION
FLUORINE-FREE METALLIC COMPLEXES FOR GAS-PHASE CHEMICAL METAL DEPOSITION
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机译:用于气相化学金属沉积的无氟金属配合物
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摘要
This invention new copper (i) or the silver (i) complex, and the impurity the metal copper or the vapor phase chemical evaporation of the silver which is not almost included (gas-phase chemical deposition) regards these uses of for the sake of.
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