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METHOD FOR RELEASING PROCESS OF STAMP AND SUBSTRATE IN NANO/MICROIMPRINT LITHOGRAPHY PROCESS AND STRUCTURE THEREOF
METHOD FOR RELEASING PROCESS OF STAMP AND SUBSTRATE IN NANO/MICROIMPRINT LITHOGRAPHY PROCESS AND STRUCTURE THEREOF
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机译:纳米/微印平版印刷工艺中印记和基质的释放方法及其结构
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摘要
The present invention to a substrate having at least 5 inch area, is a stamp from the imprinted substrate, or a fine imprint which can be smoothly separated from the trim bit from the substrate being stamped to provide a lithography process. ; The invention and the substrate to imprint the microstructure For this purpose, the fine applying a resist to the top of the microstructure and the substrate and the imprint of the stamp pattern in the resist; structure and the substrate or the stamp pattern is formed to prepare a stage for supporting the stamp; And the step of spacing using the imprinted substrate and the air pressure or vacuum to the stamp; Provides a way to separate the stamp and the substrate in a micro-imprint lithography process comprises a.
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