METHOD FOR RELEASING PROCESS OF STAMP AND SUBSTRATE IN NANO/MICROIMPRINT LITHOGRAPHY PROCESS AND STRUCTURE THEREOF

摘要

the present invention is 5 inches or more large area substrates having a fine for imprint lithography process according to the performance, is a stamp from the imprinted substrate, or a fine imprint which can be smoothly separated from the trim bit from the substrate being stamped to provide a lithography process. ; The invention and the substrate to imprint the microstructure For this purpose, the fine applying a resist to the top of the microstructure and the substrate and the imprint of the stamp pattern in the resist; structure and the substrate or the stamp pattern is formed to prepare a stage for supporting the stamp; And the step of spacing using the imprinted substrate and the air pressure or vacuum to the stamp; Provides a way to separate the stamp and the substrate in a micro-imprint lithography process comprises a.