首页> 外国专利> METHOD FOR MAKING NARROW MAGNETIC DOMAIN WALL AND MAGNETIC RESISTANCE DEVICE AND MAGNETIC FIELD GENERATING DEVICE USING THE METHOD

METHOD FOR MAKING NARROW MAGNETIC DOMAIN WALL AND MAGNETIC RESISTANCE DEVICE AND MAGNETIC FIELD GENERATING DEVICE USING THE METHOD

机译:制作窄磁畴壁的方法及使用该方法的磁阻装置和磁场产生装置

摘要

A method for forming a narrow magnetic domain wall and a magnetic resistor device and a magnetic field generating apparatus using the same are provided to adjust artificially the position and thickness of the magnetic domain wall by using a local exchange interacting structure. A first ferroelectric layer(F1) and a second ferroelectric layer(F2) are arranged to have a connection portion, wherein the connection portion is formed by a local exchange interaction between the first and the second ferroelectric layers. The thicknesses of the first and the second ferroelectric layers are different from each other. The second ferroelectric layer is composed of a first region and a second region. The first ferroelectric layer is inexistent within the second region. A magnetic domain wall is formed at a boundary between the first and the second regions. The position and thickness of the magnetic domain wall are adjusted by controlling the thickness of the first and the second ferroelectric layers and a coupling energy between the first and the second ferroelectric layers.
机译:提供了一种用于形成窄磁畴壁的方法以及一种磁阻装置和使用该方法的磁场产生装置,以通过使用局部交换相互作用结构来人为地调节磁畴壁的位置和厚度。第一铁电层(F1)和第二铁电层(F2)被布置为具有连接部分,其中,该连接部分通过第一和第二铁电层之间的局部交换相互作用而形成。第一和第二铁电层的厚度彼此不同。第二铁电层由第一区域和第二区域组成。在第二区域内不存在第一铁电层。在第一区域和第二区域之间的边界处形成磁畴壁。通过控制第一和第二铁电层的厚度以及第一和第二铁电层之间的耦合能来调节磁畴壁的位置和厚度。

著录项

  • 公开/公告号KR20060110622A

    专利类型

  • 公开/公告日2006-10-25

    原文格式PDF

  • 申请/专利权人 INHA-INDUSTRY PARTNERSHIP INSTITUTE;

    申请/专利号KR20050033054

  • 发明设计人 YOU CHUN YEOL;

    申请日2005-04-21

  • 分类号H01L27/10;H01L27/105;H01L27/115;

  • 国家 KR

  • 入库时间 2022-08-21 21:24:45

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