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Vertical Cavity Surface Emitting Laser Including Indium In The Active Region

机译:有源区中包括铟的垂直腔面发射激光器

摘要

The quantum well and barrier layers are related to achieve a long-wavelength VCSEL performance, for example, 1260 to nitrogen disposed for exemplary GaAs substrate or GaAs substrate in order to achieve the 1650㎚ range (N), aluminum (Al), antimony (Sb ) it may be grown to include phosphorus (P), and indium (in). According to the feature of the invention, the at least one quantum well (11) consisting of InGaAs; GaAsN the barrier layer (12) sandwiched between the at least one quantum well (11); And a vertical cavity surface including a GaAsN the pinning layer (13) sandwiched between said barrier layer (12) is a light emitting laser is described. The AlGaAs constrained layer sandwiched between the quantum well 11 GaAsN barrier layers 12 and the barrier layer (12) sandwiched between a 13 also may be provided in the InGaAs quantum well (11). At least one GaAsN pinning layer (13) sandwiched between the quantum well 11 of the AlGaAs barrier layers sandwiched between the 12 and the barrier layer (12) may also be provided in the InGaAs quantum well (11) is. The quantum well 11 may be up to a thickness of 50Å. The quantum well 11 may also be developed to a depth of at least 40meV. ; Vertical cavity surface emitting laser (VCSEL), a quantum well
机译:量子阱层和势垒层可实现长波VCSEL性能,例如将1260设置为氮,用于示例性GaAs衬底或GaAs衬底,以达到1650㎚范围(N),铝(Al),锑Sb)可以生长为包括磷(P)和铟(in)。根据本发明的特征,至少一个量子阱(11)由InGaAs组成; GaAsN阻挡层(12)夹在至少一个量子阱(11)之间;并且描述了包括GaAsN的垂直腔表面,该GaAsN夹在所述阻挡层(12)之间的钉扎层(13)是发光激光器。也可以在InGaAs量子阱(11)中设置夹在量子阱11之间的AlGaAs约束层,GaAsN势垒层12和夹在13之间的势垒层(12)。也可以在InGaAs量子阱(11)中设置至少一个夹在夹在AlGaAs阻挡层(12)和势垒层(12)之间的AlGaAs势垒层的量子阱11之间的GaAsN钉扎层(13)。量子阱11可以达到50埃的厚度。量子阱11也可以被显影到至少40meV的深度。 ;垂直腔表面发射激光器(VCSEL),量子阱

著录项

  • 公开/公告号KR100609433B1

    专利类型

  • 公开/公告日2006-08-08

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20047009622

  • 发明设计人 존슨랄프에이치;

    申请日2004-06-18

  • 分类号H01S5/183;H01S5/30;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:15

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