Nano-patterning method using Atomic Force Microscope based on Voltage Programming

摘要

the present invention is an atomic microscope workforce (atomic force microscope: AFM) for using Nano-transfer method (nano- relates to a patterning method), without modifying the structure of the conventional AFM, potentiometer (using a potentiometer) The purpose is to provide a method for repeatedly, yet quickly implement complex two-dimensional or three-dimensional pattern. ; nano transfer method using an atomic microscope personnel of the present invention, dividing a two-dimensional or three-dimensional object to be transferred to the pixels (pixel), the step of determining the voltage being applied to each pixel by scanning (A), (A) is determined in pixels, resulting in the transition of the voltage data to the signal voltage being applied to the time programmed by the steps of (B) and, (B) applied to the AFM via a potentiometer to the programmed voltage pattern as a function of time in step and the step (C) to implement the image, (C) convert the image of the embossed pattern is implemented by an anodizing reaction as in step intaglio pattern or etching with hydrofluoric acid or phosphoric acid in order to implement a more pronounced embossed pattern (D ) a, it is possible to construct a more fine than the photoelectric law nanostructure according to the present invention.