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TiAlN-based multi-layer hard film with high wear and oxidation resistance

机译:具有高耐磨性和抗氧化性的TiAlN基多层硬质膜

摘要

This invention relates to the oxidation resistance and wear resistance are excellent TiAlN -based multilayer hard films , and more particularly Al content is different TiAlN film is a laminated multi-layer hardness value of the unit of Figure carbide is adjusted to more than 40 GPa layer (A) and , Al content of 70% or more as high oxidation resistance and excellent TiAlN film is laminated in a single layer of 25 to unit layer hardness of 30 GPa (B) by being repeatedly forms a stacked layer structure in a certain thickness ratio , increase wear resistance and the oxidation resistance at the same time as well as the new Sikkim microstructures having higher hardness than that of the conventional thin film coating covering relates to the TiAlN -based thin-film multilayer hard .
机译:本发明涉及抗氧化性和耐磨性均优良的TiAlN基多层硬质膜,尤其是Al含量不同的TiAlN膜是将多层硬质合金图的单位硬度值调整为大于40 GPa的层(A)和70%或更高的Al含量作为高抗氧化性和优良的TiAlN膜通过以一定厚度重复形成叠层结构以25的单层层压至30 GPa的单位层硬度(B) TiAlN基薄膜多层硬膜具有较高的比值,同时提高耐磨性和抗氧化性,以及具有比传统薄膜涂层更高硬度的新型Sikkim微结构。

著录项

  • 公开/公告号KR100626406B1

    专利类型

  • 公开/公告日2006-09-21

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20040104422

  • 发明设计人 박종극;백영준;

    申请日2004-12-10

  • 分类号C23C14/35;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:00

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