Apparatus and method for measuring thickness and profile of transparent thin-film by white-light interferometry

摘要

The present invention relates to an apparatus and method for measuring the thickness and the shape of the transparent thin film using a white light interferometer. The present invention then the spectral interference light obtained by frequency the frequency-first interferogram and obtains a frequency-dependent second interferogram after spectral interference light by synthesizing the frequency. Obtaining the phase generated due to the thickness of the thin film through the first interferogram and obtains only the thickness of the thin film from the phase information. Second interferogram obtained from the phase, to obtain the thin surface film thickness information contained in the information. Thin film acquires the surface information of the film from the film surface information contained in the film thickness with the thickness information information. Therefore, the present invention is possible to carry out the process for a point or a line in real-time measurement and a single measurement without a separate driving device and strong effect on external vibrations. ; Distributed, interferometry, white light,