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METHOD OF PREPARING NANOCRYSTALLINE COBALT METAL THIN FILM USING ELECTRODEPOSITION

机译:电沉积制备纳米钴金属薄膜的方法

摘要

A method of preparing a large sized-nanocrystalline cobalt metal thin film with excellent catalytic activity in mild conditions is provided. A method of preparing a cobalt metal thin film by electrodeposition comprises: immersing a counter electrode and a working electrode into an aqueous solution that has a pH of 4 to 5 and contains a cobalt salt with a concentration of 10 to 500 mM; and impressing a voltage of -0.7 to -1.3 V to both electrodes at a temperature of 0 to 40 deg.C to form a Co metal thin film on the working electrode. The cobalt salt is selected from the group consisting of cobalt nitrate(Co(NO3)2), cobalt acetate(Co(C2H3O2)3), cobalt sulfate(CoSO4) and cobalt chloride(CoCl2). The working electrode and the counter electrode are substrates respectively selected from the group consisting of titanium(Ti), nickel(Ni), molybdenum(Mo), cadmium(Cd), platinum(Pt), gold(Au), Indium-Tin-Oxide(ITO) coated glass, stainless steel, and carbon substrate.
机译:提供了一种在温和条件下具有优异催化活性的大尺寸纳米晶钴金属薄膜的制备方法。一种通过电沉积制备钴金属薄膜的方法,该方法包括:将对电极和工作电极浸入具有4至5的pH且包含浓度为10至500 mM的钴盐的水溶液中。在0至40℃的温度下向两个电极施加-0.7至-1.3V的电压,以在工作电极上形成Co金属薄膜。钴盐选自硝酸钴(Co(NO 3)2),乙酸钴(Co(C 2 H 3 O 2)3),硫酸钴(CoSO 4)和氯化钴(CoCl 2)。工作电极和对电极是分别选自钛(Ti),镍(Ni),钼(Mo),镉(Cd),铂(Pt),金(Au),铟-锡-氧化(ITO)涂层的玻璃,不锈钢和碳基材。

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