首页> 外国专利> Photoresists with vinyl - 4 - tetrahydropyranyloxybenzal - vinyl - 4 - hydroxybenzaldehydes are described which - vinyl tetrahydropyranyl ether - - vinyl acetate copolymer, and with vinyl - 4 - tetrahydropyranyloxybenzal - vinyl tetrahydropyranyl ether - - vinyl acetate copolymer

Photoresists with vinyl - 4 - tetrahydropyranyloxybenzal - vinyl - 4 - hydroxybenzaldehydes are described which - vinyl tetrahydropyranyl ether - - vinyl acetate copolymer, and with vinyl - 4 - tetrahydropyranyloxybenzal - vinyl tetrahydropyranyl ether - - vinyl acetate copolymer

机译:描述了具有乙烯基-4-四氢吡喃基氧基苯甲醛-乙烯基-4-羟基苯甲醛的光致抗蚀剂,其中-乙烯基四氢吡喃基醚-乙酸乙烯酯共聚物,以及乙烯基-4-四氢吡喃基氧基苯甲醛-乙烯基四氢吡喃基醚-乙酸乙烯酯共聚物

摘要

Photoresist with a vinyl - 4 - tetrahydropyranyloxybenzal - vinyl tetrahydropyranyl ether - - vinyl acetate copolymer, represented by the following general formula i: whereinx mol percent in the range from 5 to 70 are;y mol percent in the range from 1 to 60, andz mole percent in the range from 0 to 40 are.
机译:用以下通式i表示的具有乙烯基-4-四氢吡喃氧基氧基苯甲醛-乙烯基四氢吡喃氧基醚-乙酸乙烯酯共聚物的光致抗蚀剂:其中x摩尔百分数为5至70; y摩尔百分数为1至60;以及z摩尔百分比在0至40范围内。

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