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Fiber optic instrument measuring layer thicknesses of e.g. photo-lacquer on semiconductor wafer, limits measurement channel by selectable restriction of measurement zone
Fiber optic instrument measuring layer thicknesses of e.g. photo-lacquer on semiconductor wafer, limits measurement channel by selectable restriction of measurement zone
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机译:光纤仪器测量的层厚度例如为半导体晶片上的光漆,通过可选的测量区域限制来限制测量通道
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摘要
To carry out the measurement, the measurement channel (34) can be restricted to a partial zone (42). The restriction is selectable by limiting evaluation in the zone. The zone has a width less than half or a third that of the measurement channel. The width is especially less than 1.5 mm. Limitation is by selection of specific optical fibers (28) to illuminate the measurement channel. The selected optical fibers have a defined relationship with respect to the reflected beam (20). An independent claim is included for the corresponding method.
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