Application of a system of thin films with complex physical functions onto substrates by medium frequency pulsed magnetron pulverisation, notably in the fabrication of optical components

摘要

A device for applying a system of thin films, with complex physical functions corresponding to a predefined conception, on a substrate by medium frequency pulsed magnetron pulverisation comprises : (A) a vacuum chamber (103) accommodating an installation for pulverisation by magnetron (105 having at least one target (108); (B) an installation (102) for introducing and extracting the substrate; (C) a first installation for the introduction of a gas vector (110); (D) a second installation for the introduction of gas (109) for introducing in a separately controlled manner at least two different reactive gases; (E) an installation for regulating, as a function of time, the ratio of the reactive gas mixture in the vacuum chamber as a function of the predefined conception of the system of thin films; (F) a measuring installation (116) for collecting a value of at least one magnitude characteristic of the pulverisation by medium frequency pulsed magnetron; (G) a regulation installation (117, 118) that compares the collected value with a first consigned value to deduce a first signal for regulating the quantity of reactive gas fed to the vacuum chamber, the ratio of the reactive gas mixture in the vacuum chamber may then be modified by the regulation installation. An independent claim is also included for the method of applying a system of thin films using this device.