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Production process for an electrically functional layer structure for semiconductor technology forms and applies mask by gravure process and structures a material layer
Production process for an electrically functional layer structure for semiconductor technology forms and applies mask by gravure process and structures a material layer
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机译:用于半导体技术的电功能层结构的生产工艺通过凹版印刷工艺形成并施加掩模并构造材料层
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摘要
A production process for an electrically functional layer structure comprises forming such a layer (30,30') to cover a substrate (20) and using a mask (40') to cover part of the layer and selectively removing material from unmasked regions. The mask is brought to the upper surface of the material by a gravure process.
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