首页> 外国专利> Method for determining surface of recesses arranged in carrier substrate involves baking carrier substrate in chamber and evacuating chamber, in order to produce and make around an essentially degassed total surface of carrier substrate

Method for determining surface of recesses arranged in carrier substrate involves baking carrier substrate in chamber and evacuating chamber, in order to produce and make around an essentially degassed total surface of carrier substrate

机译:确定布置在载体衬底中的凹部的表面的方法包括在腔室和抽空腔中烘烤载体衬底,以便产生并围绕基本上除气的载体衬底的整个表面。

摘要

The method involves baking carrier substrate (2) in chamber (5) and evacuating chamber, in order to produce and make around complete surface of carrier substrate and chamber essentially degassed and make vacuum available in chamber. Given quantity of inert gas is supplied which exceeds total surface of chamber and carrier substrate, completely covering saturation quantity of gas. Pressure value of chamber is determined and on the basis of pressure value, surface of recesses (3) arranged in carrier substrate is assigned. An independent claim is also included for the application of the method.
机译:该方法包括在腔室(5)和排空腔室中烘烤载体衬底(2),以便在载体衬底和腔室的整个表面周围产生并使其基本脱气并在腔室中提供真空。给定的惰性气体供应量超过了腔室和载体基板的总表面,完全覆盖了气体的饱和量。确定腔室的压力值,并根据该压力值分配设置在载体基板中的凹槽(3)的表面。对于该方法的应用,还包括独立权利要求。

著录项

  • 公开/公告号DE102005000688A1

    专利类型

  • 公开/公告日2006-07-20

    原文格式PDF

  • 申请/专利权人 INFINEON TECHNOLOGIES AG;

    申请/专利号DE20051000688

  • 发明设计人 POTH JOCHEN;WEIGEL SASCHA;

    申请日2005-01-04

  • 分类号G01B21/28;G01B13/20;H01L21/66;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:29

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