Method for cleaning and conditioning of substrate carrier of substrate coating apparatus, involves supplying airflow to surface area of carrier until preset thickness of coating on carrier is reached, and sucking airflow of surface area

摘要

The method involves creating separate vacuum region around a surface area (8) of substrate carrier (1), in cleaning and conditioning device with vacuum suction beam device (6). The surface area is supplied with airflow (10) containing solid particles of blasting agent (9). The airflow is conducted over the surface area and coating (4) on the substrate carrier is removed. The airflow is supplied to the surface area until preset thickness of the coating on the substrate carrier is reached. The airflow of the surface area below a hood arrangement (7) is sucked. An independent claim is included for cleaning and conditioning device.