Method for producing nanostructure on substrate involves irradiating of defined surface of substrate through ions, introduction of irradiating substrate into a supersaturated solution and removal of substrate form solution

摘要

Method involves irradiating a defined surface of the substrate (18) through ions for producing a nanostructure (22a,22b,22c) on required region (18a,18b,18c) of the surface. The irradiation brings about a selective alteration of the surface properties of the substrate. The method then involves the introduction of irradiating substrate into a supersaturated solution (20), which contains the material required to produce nanostructure. The material has been selectively deposited on the defined region in electroless fashion. The method then involves the removal of substrate form the solution after selective deposition of material.