首页> 外国专利> Nanostructure production method in substrate used in microelectromechanical system (MEMS) or microchips, involves making drops of solution for nanostructure formation float on substrate, and heating substrate to make drops evaporate

Nanostructure production method in substrate used in microelectromechanical system (MEMS) or microchips, involves making drops of solution for nanostructure formation float on substrate, and heating substrate to make drops evaporate

机译:在微机电系统(MEMS)或微芯片中使用的基板中的纳米结构生产方法,涉及使用于纳米结构形成的溶液的液滴漂浮在基板上,并加热基板以使液滴蒸发

摘要

The method involves adding drops of solution for nanostructure formation in water at a temperature above a predetermined temperature, in which the drops of solution floats to a substrate on a steam pad. The steam pad heats the substrate to evaporate the added drops, leaving and forming nanostructures on the substrate. The temperature of the substrate is set above 200 degrees Celsius, and is tilted before or immediately after dropping the solution. The substrate is heated in several minutes or few hours for continuous growth of nanostructures.
机译:该方法包括在高于预定温度的温度下在水中添加用于形成纳米结构的溶液滴,其中溶液滴漂浮到蒸汽垫上的基底上。蒸汽垫加热基板以蒸发添加的液滴,从而在基板上留下并形成纳米结构。将基板的温度设置为高于200摄氏度,并在滴加溶液之前或之后立即倾斜。在几分钟或几小时内加热基板,以连续生长纳米结构。

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