Device for irradiation with rays of charged particles has irradiation module for irradiation of photoresist films on which antistatic film adheres through radiation of rays of charged particles

摘要

Device has an irradiation module (100) for irradiation of a photoresist films on which antistatic film adheres through the radiation of the rays of the charged particles on the photoresist film, the device also has a module for treating a semiconductor wafer after the irradiation. Module for treatment of semiconductor wafer after the irradiation comprises of a means for removing of antistatic films, which replaces the antistatic film after the irradiation. A heating means causes the semiconductor wafer subjected to heating process. A means for controlling the treatment of the semiconductor wafer, after the irradiation. The semiconductor wafer is transferred to the means for removing of antistatic film after the irradiation and to the means for replacing the antistatic film after the irradiation and then the resulting semiconductor wafer is transferred to the heating means. Independent claims are also included for the following: (A) Module for treatment of semiconductor wafer; and (B) Method for irradiation with rays of charged particles.