METHOD FOR MEASURING SYSTEMATIC ERROR UNIQUE TO SHAPE MEASURING APPARATUS AND UPRIGHT SHAPE MEASURING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for measuring the accurate shape of a panel using an upright shape measuring apparatus under the situation that it has been difficult to measure the accurate shape of a panel by the influence of the deformation of the panel caused by its self weight as the shape of panels such as silicon wafers and FPD glass substrates increases in area and decreases in thickness.;SOLUTION: An error factor influencing the measurement of the shape of a large-area, thin panel using the shape measuring apparatus is analyzed, and a systematic error unique to the upright shape measuring apparatus is extracted. By measuring the shape with the extracted systematic error value as a correction value, the accurate shape of the panel can be measured.;COPYRIGHT: (C)2007,JPO&INPIT