FORMING METHOD OF INORGANIC THIN FILM PATTERN ON POLYIMIDE RESIN SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a forming method of an inorganic thin film pattern on a polyimide resin substrate by which an inorganic thin film can be formed on the surface of a polyimide resin substrate with a high adhesive reliability and pattern accuracy.;SOLUTION: The forming method of the inorganic thin film pattern consists of a process (1) of forming micro channels 4 by making a mask material 3 having micro channel grooves 2 formed in a predetermined pattern adhere closely to the surface of the polyimide resin substrate 1; a process (2) of supplying an alkali solution 5 into the micro channels 4 to form a reformed layer 6 wherein the imide ring of the polyimide resin is cleaved and thereby a carboxyl group is produced; a process (3) of supplying a metal ion-contained solution 7 into the micro channels 4, and bringing the metal ion-contained solution 7 into contact with the reformed layer 6, to produce metal salt of the carboxyl group; and a process (4) of supplying a reducing solution, reducing gas, inert gas, or active gas into the micro channels 4 to deposit the metal salt as a metal, or a metal oxide or a semiconductor to form an inorganic thin film 9.;COPYRIGHT: (C)2007,JPO&INPIT