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摘要

PROBLEM TO BE SOLVED: To provide a post-ashing treatment solution which prevents the corrosion of metallic wiring and reliably removes residue such as a degenerated photoresist film and a metallic deposition from a substrate subjected a ashing after dry etching under severer conditions in an ultrafine patterning process and a treatment method using the solution.;SOLUTION: The post-ashing treatment solution contains the salt of hydrofluoric acid and a metal ion-free base and is prepared by blending at least a polyol and a water-soluble organic solvent other than polyols. A substrate is subjected to ashing after etching through a photoresist pattern disposed on the substrate as a mask and then the substrate is treated by applying the solution.;COPYRIGHT: (C)2001,JPO