EVENING METHOD OF COATING FILM AND EVENING APPARATUS

摘要

PPROBLEM TO BE SOLVED: To provide an evening method and an evening apparatus, for making a coating film over a wafer even fully and stably. PSOLUTION: A holding table 121 of the wafer W and an X-Y stage 122 for making the holding table 121 move are arranged in a treatment vessel 120 of an evening apparatus 65. After the coating film is formed over the wafer W, the wafer W is held on the holding table 121 to be reciprocally moved in the X direction and the Y direction by the X-Y stage 122. This reciprocal movement is carried out according to a pattern of a substrate of the coating film. For example, ditches of the X direction and the Y direction are formed on the pattern of the substrate and the reciprocal movement of the Y direction is carried out more times than the reciprocal movement of the X direction when more ditches of the X direction than ditches of the Y direction are formed. PCOPYRIGHT: (C)2007,JPO&INPIT