INSULATING LAYER, INSULATING LAYER PATTERN, THIN FILM TRANSISTOR, LIQUID CRYSTAL DISPLAY, AND LIQUID PATTERN FORMATION DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce the quantity of raw materials to be used by selectively supplying the raw materials on a substrate beforehand, and to simplify a manufacturing process by eliminating a photolithography step and an etching step.;SOLUTION: This thin film formation method for forming a silicon based semiconductor film and a silicon-oxide based insulating material film, etc. comprises the steps of: spouting liquid materials plural times in the predetermined direction by making into a drop 102, flying them, and selectively applying them on a substrate 101, to form a liquid pattern 103; solidifying the liquid pattern 103 to form it into a thin film pattern 104; and irradiating a laser beam on the thin film pattern 104 to form it into a crystallized film 106. This allows the manufacturing process to be simplified by eliminating the lithography step and the etching step, and the quantity of the material used to be reduced.;COPYRIGHT: (C)2007,JPO&INPIT