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In the optical device which leads the X-ray beam which is emitted from the x-ray microscope and the x-ray exposure device null illuminant which use the optical

机译:在引导从X射线显微镜发射的X射线束的光学装置和使用该光学装置的X射线曝光装置的无效光源中

摘要

PROBLEM TO BE SOLVED: To provide an optical device where synchrotron emitted light is used to always obtain a highly strong X-ray beam in an irradiated section by detecting a relatively variable angle between a light-emitting point in a light source of synchrotron emitted light and the optical device and correcting the angle. SOLUTION: An X-ray beam 4 radiated from a light source 3 of a synchrotron emitted light is reflected by a condensing mirror 5 and is condensed in the position of a sample 7. After the beam 4 passes through the sample 7, an image is formed in an X-ray detector 9 by a Schwarzschild projection optics system 8. The X-ray beam 4 that passes through a hole in the center of the condensing mirror 5 is incident on an X-ray angle detector 6 to measure the angle with an angle displacement arithmetic circuit 10. The angle of the X-ray beam 4 can be corrected by driving a surface plate 13 with a stage drive mechanism 12 of a stage 11.
机译:解决的问题:提供一种光学装置,其中通过检测同步加速器发射光的光源中的发光点之间的相对可变角度,使用同步加速器发射的光来始终在照射区域中获得高强度的X射线束。光学设备并校正角度。解决方案:从同步加速器发射的光的光源3辐射的X射线束4被会聚镜5反射并会聚在样品7的位置。在束4穿过样品7后,图像变为由Schwarzschild投影光学系统8在X射线检测器9中形成。穿过聚光镜5中心的孔的X射线束4入射到X射线角度检测器6上,以测量角位移运算电路10。X射线束4的角度可以通过利用平台11的平台驱动机构12驱动面板13来校正。

著录项

  • 公开/公告号JP3927672B2

    专利类型

  • 公开/公告日2007-06-13

    原文格式PDF

  • 申请/专利权人 キヤノン株式会社;

    申请/专利号JP19980003375

  • 发明设计人 三宅 明;

    申请日1998-01-09

  • 分类号G21K7/00;G21K5/02;G01N23/04;H01L21/027;H05H13/04;H01J37/252;

  • 国家 JP

  • 入库时间 2022-08-21 21:10:23

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