EXPOSURE SYSTEM, EXPOSURE METHOD, AND DEVICE MANUFACTURING FACTORY

摘要

PROBLEM TO BE SOLVED: To lessen a burden related to control of information about a substrate.;SOLUTION: A wafer measuring instrument 400 measures information about a wafer W and writes that information, as prior measurement information, in an IC tag fixed to the wafer W through a writer/reader RW1 by radio communication, and reads in the prior measurement information from the IC tag fixed to the wafer W through a writer/reader RW2 after the wafer W is carried in an aligner 200. The aligner 200 performs processing related to exposure based on the prior measurement information thus read in.;COPYRIGHT: (C)2007,JPO&INPIT