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Method for measuring the Mueller matrix of the optical system of the exposure apparatus and exposure apparatus
Method for measuring the Mueller matrix of the optical system of the exposure apparatus and exposure apparatus
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机译:测量曝光设备的光学系统的穆勒矩阵的方法和曝光设备
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摘要
In an exposure apparatus, light flux from a light source is serially converted into any of a plurality of polarized light beams perpendicular to each other on Poincare sphere and is output. This polarized light beam is injected into a projection optical system or the like to be converted into a converted polarized light beam based. With a linear polarizer or a linear phase retarder being properly inserted into an optical path of the converted polarized light beam, a light intensity is measured. Stokes parameters of the converted polarized light beam are calculated based on the measured light intensity.
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