The application device, production manner and pattern formation manner of the liquid level level management manner and the management device and the resist film attaching substrate, and through the nozzle,

摘要

PROBLEM TO BE SOLVED: To perform every coating process at the same liquid level.;SOLUTION: A coating device performs coating while controlling the liquid level in a liquid tank to a constant value by monitoring the liquid level of a coat liquid in the liquid tank using a liquid level sensor 2 which outputs a first detection signal if the liquid level comes below a reference position, while outputting a second detection signal if it comes above the reference position. At least part of the coat liquid in the liquid tank is drained every time a single coating process is completed, so that the liquid level in the liquid tank is forcedly lowered (b) to such level as a liquid level sensor 52 outputs the first detection signal (ON-OFF). At that state, the liquid tank is refilled with the coat liquid to raise the liquid level in the liquid tank. The refilling of the coat liquid is stopped when the liquid level sensor 52 outputs the second detection signal (OFF-ON), thus keeping the liquid level at the reference position.;COPYRIGHT: (C)2004,JPO