首页> 外国专利> Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry

Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry

机译:用于单组分CMP浆料的氧化铈粉末,其制备方法,包括该铈氧化物粉末的单组分CMP浆料组合物以及使用该浆料的浅沟槽隔离的方法

摘要

A cerium oxide powder for one-component CMP slurry, which has a specific surface area of 5 m2/g or more, and a ratio of volume fraction of pores with a diameter of 3 nm or more to that of pores with a diameter less than 3 nm of 8:2˜2:8. A method for preparing the same, a one-component CMP slurry comprising the same as an abrasive material, and a method of shallow trench isolation using the one-component CMP slurry are also disclosed. The CMP slurry causes no precipitation of the cerium oxide powder even if it is provided as a one-component CMP slurry, because the CMP slurry uses, as an abrasive material, cerium oxide powder that is obtained via a low-temperature calcination step, optionally a pulverization step, and a high-temperature calcination step and has a high pore fraction and low strength.
机译:用于一种单组分CMP浆料的氧化铈粉末,其比表面积为5m 2 / g或更大,并且直径为3nm或更大的孔的体积分数与直径小于3nm的孔的直径为8:2〜2:8。还公开了其制备方法,包含其作为磨料的单组分CMP浆料以及使用该单组分CMP浆料进行浅沟槽隔离的方法。即使以单组分CMP浆料的形式提供,CMP浆料也不会沉淀出氧化铈粉末,因为该CMP浆料可选地使用通过低温煅烧步骤获得的氧化铈粉末作为研磨材料。粉碎步骤和高温煅烧步骤具有高孔隙率和低强度。

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