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Chalcogenide precursor compound and method for preparing chalcogenide thin film using the same

机译:硫属化物前体化合物和使用该化合物制备硫属化物薄膜的方法

摘要

Disclosed herein are a soluble chalcogenide precursor compound and a method for preparing a chalcogenide thin film using the precursor compound by a solution deposition process, e.g., spin coating or dip coating. In the method, the use of the chalcogenide precursor as an inorganic semiconductor material soluble in organic solvents enables the preparation of a semiconductor thin film having excellent electrical and physical properties (e.g., crystallinity). In addition, a large-area thin film can be prepared by a solution deposition process, thus contributing to the simplification of procedures and reduction of preparation costs. Therefore, the method can be effectively applied in a wide variety of fields, such as thin film transistors, electroluminescent devices, photovoltaic cells and memory devices.
机译:本文公开了可溶性硫族化物前体化合物以及使用该前体化合物通过溶液沉积工艺(例如旋涂或浸涂)制备硫族化物薄膜的方法。在该方法中,使用硫族化物前体作为可溶于有机溶剂的无机半导体材料使得能够制备具有优异的电和物理性质(例如,结晶度)的半导体薄膜。另外,可以通过溶液沉积法制备大面积的薄膜,从而有助于简化工序并降低制备成本。因此,该方法可以有效地应用于各种各样的领域,例如薄膜晶体管,电致发光器件,光伏电池和存储器件。

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